Application of CCl 2 F 2 - and CCl 4 -based plasmas for RIE of GaSb and related materials

Author: Piotrowska A.   Kaminska E.   Piotrowski T.T.   Guziewicz M.   Golaszewska K.   Papis E.   Wrobel J.   Perchuc L.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.56, Iss.1, 2000-01, pp. : 57-61

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Abstract