Effects of oxygen ion beam plasma conditions on the properties of Indium tin oxide thin films

Author： Bae J.W. Kim H.J. Kim J.S. Lee N.E. Yeom G.Y.

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.56, Iss.1, 2000-01, pp. : 77-81

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Effect of ion beam energy on the electrical, optical, and structural properties of indium tin oxide thin films prepared by direct metal ion beam deposition technique

By Kim D. Kim S.

Thin Solid Films, Vol. 408, Iss. 1, 2002-04 ,pp. : 218-222

Elsevier

Access to resources Recommend Favorite

Room-temperature deposition of indium tin oxide thin films with plasma ion-assisted evaporation

By Laux S. Kaiser N. Zoller A. Gotzelmann R. Lauth H. Bernitzki H.

Thin Solid Films, Vol. 335, Iss. 1, 1998-11 ,pp. : 1-5

Elsevier

Access to resources Recommend Favorite

Preparation and piezoresistive properties of reactively sputtered indium tin oxide thin films

By Dyer S.E. Amons P.S. Gregory O.J. Bruins Slot A.

Thin Solid Films, Vol. 288, Iss. 1, 1996-11 ,pp. : 279-286

Elsevier

Access to resources Recommend Favorite

Effect of substrate temperature on the bonded states of indium tin oxide thin films deposited by plasma enhanced chemical vapor deposition

By Kim Y.-S. Park Y.-C. Ansari S.G. Lee B.-S. Shin H.-S.

Thin Solid Films, Vol. 426, Iss. 1, 2003-02 ,pp. : 124-131

Elsevier

Access to resources Recommend Favorite

Electrical and optical properties of sputter deposited tin doped indium oxide thin films with silver additive

By Hultaker A. Jarrendahl K. Lu J. Granqvist C.-G. Niklasson G.A.

Thin Solid Films, Vol. 392, Iss. 2, 2001-07 ,pp. : 305-310

Elsevier

Access to resources Recommend Favorite