Axial distribution of emission and rate of deposition of diamond-like film in r.f. discharges in CH 4

By Petrovic Z.L.   Jelenak A.   Tomcik B.   Boskovic B.  

Thin Solid Films, Vol. 304, Iss. 1, 1997-07 ,pp. : 136-143

Elsevier

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Structural and optical properties of hydrogenated amorphous silicon-carbon alloys grown by plasma-enhanced chemical vapour deposition at various rf powers

By Ambrosone G.   Coscia U.  

Philosophical Magazine B, Vol. 82, Iss. 1, 2002-01 ,pp. : 35-46

Taylor & Francis Ltd

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Infrared absorption spectroscopy measurements of amorphous CN x films prepared in CH 4 /N 2 r.f. discharge

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Thin Solid Films, Vol. 349, Iss. 1, 1999-07 ,pp. : 115-119

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Deposition and properties of germanium/carbon films deposited from tetramethylgermanium in a parallel plate RF discharge

By Gazicki M.   Ledzion R.   Mazurczyk R.   Pawlowski S.  

Thin Solid Films, Vol. 322, Iss. 1, 1998-06 ,pp. : 123-131

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Effect of GeF 4 addition on the growth of hydrogenated microcrystalline silicon film by plasma-enhanced chemical vapor deposition

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