Author： Janossy M. Gateva S. Andreeva C. Cartaleva S.
Publisher： Elsevier
ISSN： 0042-207X
Source： Vacuum, Vol.58, Iss.2, 2000-08, pp. : 272-279
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Optogalvanic effect sign change of the 667.8nm He line in a hollow cathode discharge plasma
By Gateva S. Janossy M. Cartaleva S.
Vacuum, Vol. 69, Iss. 1, 2002-12 ,pp. :
Access to resources
Recommend
Sputtering-atomizing and optogalvanic properties of an Ar-Mg Hollow cathode discharge
Vacuum, Vol. 51, Iss. 2, 1998-10 ,pp. :
Plasma ion source with hollow cathode
By Latuszynski A. Drozdziel A. Pyszniak K. Dupak J. Maczka D. Meldizon J.
Vacuum, Vol. 70, Iss. 2, 2003-03 ,pp. :
Ti and Fe cathode sputtering by the glow discharge plasma
By Wronski Z. Sielanko J. Herec J.
Vacuum, Vol. 70, Iss. 2, 2003-03 ,pp. :