Author: Strumpfel J. May C.
Publisher: Elsevier
ISSN: 0042-207X
Source: Vacuum, Vol.59, Iss.2, 2000-11, pp. : 500-505
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
ITO coating by reactive magnetron sputtering-comparison of properties from DC and MF processing
Thin Solid Films, Vol. 351, Iss. 1, 1999-08 ,pp. :
Uniformity improvement in dc magnetron sputtering deposition on a large area substrate
By Seino T. Kawakubo Y. Nakajima K. Kamei M.
Vacuum, Vol. 51, Iss. 4, 1998-12 ,pp. :