Optical and structural properties of dense SiO 2 , Ta 2 O 5 and Nb 2 O 5 thin-films deposited by indirectly reactive sputtering technique

Author: Song Y.   Sakurai T.   Maruta K.   Matusita A.   Matsumoto S.   Saisho S.   Kikuchi K.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.59, Iss.2, 2000-11, pp. : 755-763

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Abstract