Optical properties of Ta 2 O 5 thin films deposited using the spin coating process

By Ghodsi F.E.   Tepehan F.Z.   Tepehan G.G.  

Thin Solid Films, Vol. 295, Iss. 1, 1997-02 ,pp. : 11-15

Elsevier

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Electrical characterization of Ta 2 O 5 films deposited by laser reactive ablation of metallic Ta

By Fu Z.-W.   Chen L.-Y.   Qin Q.-Z.  

Thin Solid Films, Vol. 340, Iss. 1, 1999-02 ,pp. : 164-168

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Optical and structural properties of dense SiO 2 , Ta 2 O 5 and Nb 2 O 5 thin-films deposited by indirectly reactive sputtering technique

By Song Y.   Sakurai T.   Maruta K.   Matusita A.   Matsumoto S.   Saisho S.   Kikuchi K.  

Vacuum, Vol. 59, Iss. 2, 2000-11 ,pp. : 755-763

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Annealing ultra thin Ta 2 O 5 films deposited on bare and nitrogen passivated Si(100)

By Mao A.Y.   Son K.-A.   Hess D.A.   Brown L.A.   White J.M.   Kwong D.L.   Roberts D.A.   Vrtis R.N.  

Thin Solid Films, Vol. 349, Iss. 1, 1999-07 ,pp. : 230-237

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Dielectric constants of Ta 2 O 5 thin films deposited by r.f. sputtering

By Shibata S.  

Thin Solid Films, Vol. 277, Iss. 1, 1996-05 ,pp. : 1-4

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