Effect of d.c. bias on the deposition rate using r.f.-d.c. coupled magnetron sputtering for SnN x thin films

Author： Kamei R. Migita T. Tanaka T. Kawabata K.

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.59, Iss.2, 2000-11, pp. : 764-770

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