Modeling and simulation of plasma enhanced processing for integrated circuit fabrication

Author： Prasad V.   Bloomfield M.O.   Richards D.F.   Liang H.   Cale T.S.  

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.65, Iss.3, 2002-05, pp. : 443-455

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