Effects of oxygen gettering and target mode change in the formation process of reactively RF sputtered WO x thin films

Author: Yamamoto A.   Abe Y.   Kawamura M.   Sasaki K.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.66, Iss.3, 2002-08, pp. : 269-273

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Abstract