Deposition of carbon films by plasma-based ion implantation using glow discharge plasma ignited by high voltage pulses applied to substrates

Author: Shinno H.   Ishioka K.   Kitajima M.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.66, Iss.3, 2002-08, pp. : 335-339

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Abstract