Characterization of trimethylaluminum-N 2 O-He glow discharge in plasma-enhanced chemical vapor deposition of aluminum oxide films

Author： Kim Y.-C. Chun J.S. Lee W.-J.

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.258, Iss.1, 1995-03, pp. : 67-74

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