Limited reaction growth of YSZ (ZrO 2 :Y 2 O 3 ) thin films for gate insulator

Author: Sasaki K.   Hasu T.   Sasaki K.   Hata T.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.66, Iss.3, 2002-08, pp. : 403-408

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Abstract