Effect of sputtering gas pressure and nitrogen concentration on crystal orientation and residual stress in sputtered AlN films

Author： Kusaka K.   Taniguchi D.   Hanabusa T.   Tominaga K.  

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.66, Iss.3, 2002-08, pp. : 441-446

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