Effect of input power on crystal orientation and residual stress in AlN film deposited by dc sputtering

Author： Kusaka K.   Taniguchi D.   Hanabusa T.   Tominaga K.  

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.59, Iss.2, 2000-11, pp. : 806-813

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