The influence of process parameters and annealing temperature on the physical properties of sputtered NiO thin films

Author： Hotovy I.   Huran J.   Spiess L.   Liday J.   Sitter H.   Hasck S.  

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.69, Iss.1, 2002-12, pp. : 237-242

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