Characterization of near surface region of plasma immersion ion-implanted silicon using Rutherford backscattering spectrometry, transmission electron microscopy and spectroscopic ellipsometry

Author： Shaaban E.R.   Lohner T.   Pinter I.   Petrik P.   Khanh N.Q.   Horvath Z.E.   Gyulai J.  

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.71, Iss.1, 2003-05, pp. : 27-31

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