Effect of sputtering power on microstructure of dielectric ceramic thin films by RF magnetron sputtering method using (Ba_0.3Sr_0.7)(Zn_1/3Nb_2/3)O₃ as target

By Shi Feng  

Journal of Materials Science: Materials in Electronics, Vol. 22, Iss. 9, 2011-09 ,pp. : 1290-1296

Springer Publishing Company

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Fabrication of thin films by sputtering deposition using (Ba_0.3Sr_0.7)(Zn_1/3Nb_2/3)O₃ ceramic as target

By Shi Feng  

Journal of Materials Science: Materials in Electronics, Vol. 22, Iss. 7, 2011-07 ,pp. : 771-775

Springer Publishing Company

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Effect of annealing time on microstructure and morphology of thin films by sputtering deposition with (Ba_0.3Sr_0.7)(Zn_1/3Nb_2/3)O₃ target

By Shi Feng  

Journal of Materials Science: Materials in Electronics, Vol. 22, Iss. 6, 2011-06 ,pp. : 596-600

Springer Publishing Company

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Erratum to: Effects of in situ annealing on the properties of Al-doped ZnO thin films deposited by RF magnetron sputtering

By Kim Deok-Kyu   Park Choon-Bae  

Journal of Materials Science: Materials in Electronics, Vol. 25, Iss. 4, 2014-04 ,pp. : 1596-1596

Springer Publishing Company

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Effects of in situ annealing on the properties of Al-doped ZnO thin films deposited by RF magnetron sputtering

By Kim Deok-Kyu   Park Choon-Bae  

Journal of Materials Science: Materials in Electronics, Vol. 25, Iss. 4, 2014-04 ,pp. : 1589-1595

Springer Publishing Company

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