Electrochemical metal deposition on atomically nearly-flat silicon surfaces accompanied by nano-hole formation

Author： Morisawa K. Ishida M. Yae S. Nakato Y.

Publisher： Elsevier

ISSN： 0013-4686

Source： Electrochimica Acta, Vol.44, Iss.21, 1999-06, pp. : 3725-3729

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