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Elsevier

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The role of parameters in plasma assisted vapor deposition of tin/tin-oxide coatings

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Crystallinity of Al 2 O 3 films deposited by metalorganic chemical vapor deposition

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Deposition and characterization of cerium oxide conversion coatings on aluminum alloy 7075-T6

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Effect of Cl/H input ratio on the growth rate of MoSi 2 coatings formed by chemical vapor deposition of Si on Mo substrates from SiCl 4 -H 2 precursor gases

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