Dose-dependent dynamics of nanocluster distribution in silicon implanted with Te + and Pb + ions: computer simulation and TEM study

By Bankov P.   Kalitzova M.   Karpuzov D.   Zollo G.   Vitali G.   Pizzuto C.   Angelov C.   Faure J.   Kilian L.  

Vacuum, Vol. 69, Iss. 1, 2002-12 ,pp. : 455-460

Elsevier

Access to resources Recommend Favorite

Raman study of diamond films deposited by MPCVD: Effect of the substrate position

By Gonon P.   Gheeraert E.   Deneuville A.   Abello L.  

Thin Solid Films, Vol. 256, Iss. 1, 1995-02 ,pp. : 13-22

Elsevier

Access to resources Recommend Favorite

Effect of temperature and substrate on the growth behaviors of chemical vapor deposited Al films with dimethylethylamine alane source

By Woong Jang T.   Moon W.   Tae Baek J.   Tae Ahn B.  

Thin Solid Films, Vol. 333, Iss. 1, 1998-11 ,pp. : 137-141

Elsevier

Access to resources Recommend Favorite

Growth characteristics of multilayered physical vapour deposited TiN/TaN x on high speed steel substrate

By Nordin M.   Ericson F.  

Thin Solid Films, Vol. 385, Iss. 1, 2001-04 ,pp. : 174-181

Elsevier

Access to resources Recommend Favorite

Epitactic growth of a decagonal phase in an Al–Ni–Co alloy film deposited on a (0001) sapphire substrate

By Saito K.   Ichioka K.   Sugawara S.  

Philosophical Magazine, Vol. 85, Iss. 30, 2005-10 ,pp. : 3629-3641

Taylor & Francis Ltd

Access to resources Recommend Favorite