Dose-dependent dynamics of nanocluster distribution in silicon implanted with Te + and Pb + ions: computer simulation and TEM study

Author： Bankov P. Kalitzova M. Karpuzov D. Zollo G. Vitali G. Pizzuto C. Angelov C. Faure J. Kilian L.

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.69, Iss.1, 2002-12, pp. : 455-460

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