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Journal of Electroceramics, Vol. 17, Iss. 2-4, 2006-12 ,pp. : 165-168

Springer Publishing Company

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Effect of vanadium doping on ferroelectric and electrical properties of Bi 3.25 La 0.75 Ti 3 O 12 thin film

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Synthesis and properties of ferroelectric Si-doped (Bi, Nd) 4 Ti 3 O 12 thin films by chemical solution deposition

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Flux-mediated epitaxy for ferroelectric Bi 4 Ti 3 O 12 single crystal film growth

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