Dry etching of III-V semiconductors in IBr/Ar electron cyclotron resonance plasmas

Author: Lee J.   Hong J.   Lambers E.   Abernathy C.   Pearton S.   Hobson W.   Ren F.  

Publisher: Springer Publishing Company

ISSN: 1543-186X

Source: Journal of Electronic Materials, Vol.26, Iss.5, 1997-05, pp. : 429-435

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Abstract