Comparison of dry etching of III-V semiconductors in ICl/Ar and IBr/Ar electron cyclotron resonance plasmas

Author: Lee J.   Hong J.   Lambers E.   Abernathy C.   Pearton S.   Hobson W.   Ren F.  

Publisher: Springer Publishing Company

ISSN: 1543-186X

Source: Journal of Electronic Materials, Vol.26, Iss.11, 1997-11, pp. : 1314-1319

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Abstract