Dopant activation and surface morphology of ion implanted 4H- and 6H-silicon carbide

Author: Capano M.   Ryu S.   Melloch M.   Cooper J.   Buss M.  

Publisher: Springer Publishing Company

ISSN: 1543-186X

Source: Journal of Electronic Materials, Vol.27, Iss.4, 1998-04, pp. : 370-376

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Abstract