Study of plasma etching of -SiC thin films grown on Si-substrate

Author： Chai C.   Yang Y.   Li Y.   Jia H.  

Publisher： Elsevier

ISSN： 0925-3467

Source： Optical Materials, Vol.23, Iss.1, 2003-07, pp. : 103-107

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

On the use of a neural network to characterize the plasma etching of SiON thin films

By Kim B.   Lee B.   Lee K.  

Journal of Materials Science: Materials in Electronics, Vol. 16, Iss. 10, 2005-10 ,pp. : 673-679

Springer Publishing Company

Access to resources Recommend Favorite

Transparent SiC thin films by PEG-SDS-assisted self-assembly of SiC nanoparticles

By Moon I.-S.   Cho G.  

Materials Science and Engineering: C, Vol. 24, Iss. 1, 2004-01 ,pp. : 301-305

Elsevier

Access to resources Recommend Favorite

Interfacial reaction and adhesion between SiC and thin sputtered nickel films

By Lim C.S.   Nickel H.   Naoumidis A.   Gyarmati E.  

Journal of Materials Science, Vol. 32, Iss. 24, 1997-12 ,pp. : 6567-6572

Springer Publishing Company

Access to resources Recommend Favorite

ZrO2 thin films on Si substrate

By Wong Yew   Cheong Kuan  

Journal of Materials Science: Materials in Electronics, Vol. 21, Iss. 10, 2010-10 ,pp. : 980-993

Springer Publishing Company

Access to resources Recommend Favorite

Study of the sintering properties of plasma synthesized ultrafine SiC powders

By Guo J.Y.   Gitzhofer F.   Boulos M.I.   Ishigaki T.   Mieno M.  

Journal of Materials Science, Vol. 32, Iss. 19, 1997-12 ,pp. : 5257-5269

Springer Publishing Company

Access to resources Recommend Favorite