Author： Camposeo A. Maragò O.M. Fazio B. Klöter B. Meschede D. Rasbach U. Weber C. Arimondo E.
Publisher： Springer Publishing Company
ISSN： 0946-2171
Source： Applied Physics B, Vol.85, Iss.4, 2006-12, pp. : 487-491
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Resist debris formation in electron beam lithography
By Deshmukh P.R. Rangra K.J. Wadhawan O.P.
Vacuum, Vol. 52, Iss. 4, 1999-04 ,pp. :
Access to resources
Recommend
Mechanisms of Oxygen Atom Transfer between Main‐Group Elements
EUROPEAN JOURNAL OF INORGANIC CHEMISTRY (ELECTRONIC), Vol. 2015, Iss. 24, 2015-08 ,pp. :
Group representations that resist random sampling
RANDOM STRUCTURES AND ALGORITHMS, Vol. 47, Iss. 3, 2015-10 ,pp. :
Ultrathin resist films patterning using a synchrotron radiation lithography system
Vacuum, Vol. 48, Iss. 1, 1997-01 ,pp. :