Phenomenon of resist debris formation in electron beam lithography and its possible application

Author： Deshmukh P.R. Rangra K.J. Singh M. Vyas P.D. Pal B.B.

Publisher： Elsevier

ISSN： 0042-207X

Source： Vacuum, Vol.47, Iss.11, 1996-11, pp. : 1305-1311

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