Conventional and modified Schwarzschild objective for EUV lithography: design relations

Author： Bollanti S.   Di Lazzaro P.   Flora F.   Mezi L.   Murra D.   Torre A.  

Publisher： Springer Publishing Company

ISSN： 0946-2171

Source： Applied Physics B, Vol.85, Iss.4, 2006-12, pp. : 603-610

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