Mo/Si multilayers for EUV lithography by ion beam sputter deposition

Author: Chasse T.   Neumann H.   Ocker B.   Scherer M.   Frank W.   Frost F.   Hirsch D.   Schindler A.   Wagner G.   Lorenz M.   Otto G.   Zeuner M.   Rauschenbach B.  

Publisher: Elsevier

ISSN: 0042-207X

Source: Vacuum, Vol.71, Iss.3, 2003-05, pp. : 407-415

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract