Using IR laser radiation for backside etching of fused silica

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Submicrometer grating fabrication in fused silica by interferometric laser-induced backside wet etching technique

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Laser etching of fused silica using an adsorbed toluene layer

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104 nm period grating fabrication in fused silica by immersion two-beam interferometric laser induced backside wet etching technique

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Transient pressure induced by laser ablation of liquid toluene: toward the understanding of laser-induced backside wet etching

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