Sizeable enhancement of anti-weak localization effect in In 2 O 3-x thin film caused by H 2 gas mixing in N 2 gas atmosphere on heat treatment

Author： Kobori H. Kawaguchi M. Hatta N. Ohyama T.

Publisher： Elsevier

ISSN： 1386-9477

Source： Physica E, Vol.18, Iss.1, 2003-05, pp. : 296-297

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