On chemo-mechanical polishing (CMP) of silicon nitride (Si 3 N 4 ) workmaterial with various abrasives

Author: Komanduri R.   Jiang M.   Wood N.O.  

Publisher: Elsevier

ISSN: 0043-1648

Source: Wear, Vol.220, Iss.1, 1998-09, pp. : 59-71

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Abstract