SOME INVESTIGATIONS ON THE ANISOTROPY OF THE CHEMICAL ETCHING OF (h k 0) AND (h h l) SILICON PLATES IN A NaOH 35% SOLUTION. PART III: DETERMINATION OF A DATABASE FOR THE SIMULATOR TENSOSIM AND PREDICTION OF 2D ETCHING SHAPES

Author： TELLIER C. R.  

Publisher： Taylor & Francis Ltd

ISSN： 0882-7516

Source： Active and Passive Electronic Components, Vol.26, Iss.2, 2003-06, pp. : 95-109

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