![](/images/ico/ico_close.png)
![](/images/ico/ico3.png)
Publisher: Elsevier
Founded in: 1983
Total resources: 4
E-ISSN: 1873-5568
ISSN: 0167-9317
Subject:
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Microelectronic Engineering
Menu
![](/images/ico/ico5.png)
Wavelet analysis of directional variations of plasma etch profile
By Choi S.R., Kim B., Kim B.S., Lee K.K. in (2004)
Microelectronic Engineering , Vol. 71, Iss. 1, 2004-01 , pp.![](/images/ico/ico5.png)
High temperature stability of Zr-Si-N diffusion barrier in Cu/Si contact system
By Wang Y., Zhu C., Song Z., Li Y. in (2004)
Microelectronic Engineering , Vol. 71, Iss. 1, 2004-01 , pp.![](/images/ico/ico5.png)
Control of plasma equipment by regulating radio frequency impedance matching
By Kim B., Park J.-H., Kim B.S. in (2004)
Microelectronic Engineering , Vol. 71, Iss. 1, 2004-01 , pp.![](/images/ico/ico5.png)
Processing chemically amplified resists on advanced photomasks using a thermal array
By Schaper C.D., El-Awady K., Kailath T., Tay A., Lee L.L., Ho W.-K., Fuller S.E. in (2004)
Microelectronic Engineering , Vol. 71, Iss. 1, 2004-01 , pp.![](/images/ico/ico5.png)
By Sun W., Wu J., Lu S., Yi Y., Shi L. in (2004)
Microelectronic Engineering , Vol. 71, Iss. 1, 2004-01 , pp.![](/images/ico/ico5.png)
Rigorous electromagnetic modeling of near-field phase-shifting contact lithography
By Wang F., Horn M.W., Lakhtakia A. in (2004)
Microelectronic Engineering , Vol. 71, Iss. 1, 2004-01 , pp.![](/images/ico/ico5.png)
The Effect of nitrogen partial pressure on Zr-Si-N diffusion barrier
By Song Z.X., Xu K.W., Chen H. in (2004)
Microelectronic Engineering , Vol. 71, Iss. 1, 2004-01 , pp.![](/images/ico/ico5.png)
By Du T., Luo Y., Desai V. in (2004)
Microelectronic Engineering , Vol. 71, Iss. 1, 2004-01 , pp.![](/images/ico/ico5.png)
Thermal stability study of NiSi and NiSi 2 thin films
By Zhao F.F., Zheng J.Z., Shen Z.X., Osipowicz T., Gao W.Z., Chan L.H. in (2004)
Microelectronic Engineering , Vol. 71, Iss. 1, 2004-01 , pp.![](/images/ico/ico5.png)
In-plane reactive ion etched fibre grooves for optical integration and coupling
By Chaffey J., Austin M., Switala I. in (2004)
Microelectronic Engineering , Vol. 71, Iss. 1, 2004-01 , pp.