Author： Thoang Do Dac Kovacs Balazs Mojzes Imre
Publisher： Taylor & Francis Ltd
ISSN： 1362-3060
Source： International Journal of Electronics, Vol.86, Iss.3, 1999-03, pp. : 281-286
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Abstract
A method to determine specific contact resistance and sheet resistivity under the contact using two L-type cross Kelvin resistors is presented. In the model analysed in the present paper, the sheet resistivity under the contact was different from the resistance of the layer outside the contact. This difference is caused by metallurgical reactions taking place during the heat treatment of the metallized wafer.
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