Author： Haanappel V.A.C.
Publisher： Taylor & Francis Ltd
ISSN： 1568-5616
Source： Journal of Adhesion Science and Technology, Vol.11, Iss.7, 1997-01, pp. : 905-919
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Abstract
Thin alumina films, deposited at 280°C on several high alloy steels by low-pressure metal-organic chemical vapor deposition (LP-MOCVD), were annealed at 0.17 kPa in a nitrogen atmosphere for 2, 4, and 17 h at 600 and 800°C. Film adhesion was studied by scanning scratch testing (SST) and Auger electron spectroscopy (AES). The best adhesion properties were obtained with commercial oxide dispersion-strengthened (ODS) high-temperature alloys, especially PM 3030. Among the 'normally' high alloy stainless steels, type AISI-321 showed the best adhesion. The other stainless steel-alumina combinations exhibited a reduced critical load, Lc, after thermal treatment. Alumina on ODS alloys exhibited an increased adhesion. AES studies revealed that this increase could be explained by: (1) the presence of sulfur-trapping elements, preventing segregation of sulfur at the interface; and (2) titanium and carbon enrichment at the interface, resulting in an anchoring effect between the oxide and the substrate.
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