Optical Spectroscopy Applied to the Study of Plasma Etching

Author： Frieser R. G.   Nogay J.  

Publisher： Society for Applied Spectroscopy

ISSN： 0003-7028

Source： Applied Spectroscopy, Vol.34, Iss.1, 1980-01, pp. : 31-33

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

A Study of the Optical Emission from an rf Plasma during Semiconductor Etching

By Harshbarger W. R.   Porter R. A.   Miller T. A.   Norton P.  

Applied Spectroscopy, Vol. 31, Iss. 3, 1977-05 ,pp. : 201-207

Society for Applied Spectroscopy

Access to resources Recommend Favorite

In Situ Analysis of Fluorinated Gases in Plasma Etching by Infrared Spectroscopy

By Poll H. U.   Hinze D.   Schlemm H.  

Applied Spectroscopy, Vol. 36, Iss. 4, 1982-07 ,pp. : 445-451

Society for Applied Spectroscopy

Access to resources Recommend Favorite

A Plasma Torch Configuration for Inductively Coupled Plasma as a Source in Optical Emission Spectroscopy and Atomic Absorption Spectroscopy

By Mermet J. M.   Trassy C.  

Applied Spectroscopy, Vol. 31, Iss. 3, 1977-05 ,pp. : 237-239

Society for Applied Spectroscopy

Access to resources Recommend Favorite

Optical Emission Spectroscopy of Abnormal Glow Region in Nitrogen Plasma

By Qayyum A.   Zeb Shaista   Ali Shujaat   Waheed A.   Zakaullah M.  

Plasma Chemistry and Plasma Processing, Vol. 25, Iss. 5, 2005-10 ,pp. : 551-564

Springer Publishing Company

Access to resources Recommend Favorite

The use of impedance spectroscopy and optical reflection spectroscopy to study modified aluminium surfaces

By De Laet J.   Terryn H.   Vereecken J.  

Electrochimica Acta, Vol. 41, Iss. 7, 1996-05 ,pp. : 1155-1161

Elsevier

Access to resources Recommend Favorite