FT-IR Study of a Chemically Amplified Resist for X-ray Lithography

Author: Tan T. L.   Kudryashov V. A.   Tan B. L.  

Publisher: Society for Applied Spectroscopy

ISSN: 0003-7028

Source: Applied Spectroscopy, Vol.57, Iss.7, 2003-07, pp. : 842-849

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