Gas-phase reaction chemistry of 1,1-dimethyl-1-silacyclobutane as a precursor gas in the hot-wire chemical vapor deposition process — Formation of tetramethylsilane and trimethylsilane

Author： Tong L.   Shi Y. J.  

Publisher： NRC Research Press

ISSN： 1480-3291

Source： Canadian Journal of Chemistry, Vol.89, Iss.1, 2011-01, pp. : 19-26

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Effect of pressure on the gas-phase chemistry when using monomethylsilane and dimethylsilane in hot-wire chemical vapor deposition

By  

Canadian Journal of Chemistry, Vol. 93, Iss. 1, 2015-01 ,pp. : 82-90

NRC Research Press

Access to resources Recommend Favorite

DFT Study on the Gas‐Phase Potential Energy Surface Crossing Mechanism of ZnO Formation from Diethylzinc and Triplet Oxygen during Metal‐Organic Chemical Vapor Deposition

By  

ChemistrySelect, Vol. 3, Iss. 7, 2018-02 ,pp. : 1961-1966

John Wiley & Sons Inc

Access to resources Recommend Favorite

Gas-Phase Generation and Photoelectron Spectrum of 1,1-Dimethyl-N-Dimethylsilylsilanimine

By Métail V.   Joanteguy S.   Chrostowska-Senio A.   Pfister-Guillouzo G.   Systermans A.   Ripoll J.  

Main Group Chemistry, Vol. 2, Iss. 2, 1997-10 ,pp. : 97-106

Taylor & Francis Ltd

Access to resources Recommend Favorite

Gas-phase radiation-chemical formation of dioxins from chlorinated phenols

By Gerasimov G.  

High Energy Chemistry, Vol. 41, Iss. 1, 2007-02 ,pp. : 20-24

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

Theoretical study of the gas-phase decomposition of Pb[(C6H5)2PSSe]2 single-source precursor for the chemical vapour deposition of binary and ternary lead chalcogenides

By  

Canadian Journal of Chemistry, Vol. 93, Iss. 3, 2015-01 ,pp. : 317-325

NRC Research Press

Access to resources Recommend Favorite