New Copolymers of Dialkyl Fumarates with Norbornene Derivatives for Sub-0.2 µm Lithography at a Wavelength of 193 nm: Synthesis and Thermal and Photochemical Transformations

Author： Vainer A.   Dyumaev K.   Eremina L.   Tamarkina R.   Ternovskii E.   Shvartsburg L.  

Publisher： MAIK Nauka/Interperiodica

ISSN： 0012-5016

Source： Doklady Physical Chemistry, Vol.404, Iss.1-3, 2005-09, pp. : 159-161

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