Chemical Composition of Boron Carbonitride Films Grown by Plasma-Enhanced Chemical Vapor Deposition from Trimethylamineborane

Author: Kosinova M.L.   Rumyantsev Y.M.   Golubenko A.N.   Fainer N.I.   Ayupov B.M.   Dolgovesova I.P.   Kolesov B.A.   Kaichev V.V.   Kuznetsov F.A.  

Publisher: MAIK Nauka/Interperiodica

ISSN: 0020-1685

Source: Inorganic Materials, Vol.39, Iss.4, 2003-04, pp. : 366-373

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