Hybrid H 2 -Selective Silica Membranes Prepared by Chemical Vapor Deposition

By Gu Yunfeng   Vaezian Bita   Khatib Sheima J.   Oyama S. Ted   Wang Zhenxing   Achenie Luke  

Separation Science and Technology, Vol. 47, Iss. 12, 2012-07 ,pp. : 1698-1708

Taylor & Francis Ltd

Access to resources Recommend Favorite

Structure of Chemical Vapor Deposition Titania/Silica Gel

By Leboda R.   Gun'ko V.M.   Marciniak M.   Malygin A.A.   Malkin A.A.   Grzegorczyk W.   Trznadel B.J.   Pakhlov E.M.   Voronin E.F.  

Journal of Colloid and Interface Science, Vol. 218, Iss. 1, 1999-10 ,pp. : 23-39

Academic Press

Access to resources Recommend Favorite

Metalorganic Chemical Vapor Deposition of Oxide Films on Semiconductor Substrates Using Aluminum, Gallium, and Indium Alkyl Chloride Precursors

By Mittov O.N.   Ponomareva N.I.   Mittova I.Y.  

Inorganic Materials, Vol. 38, Iss. 5, 2002-05 ,pp. : 438-444

MAIK Nauka/Interperiodica

Access to resources Recommend Favorite

Chemical Vapor Deposition Precursors for High Dielectric Oxides: Zirconium and Hafnium Oxide

By Walawalkar Mrinalini   Kottantharayil Anil   Rao V. Ramgopal  

Synthesis and Reactivity in Inorganic, Metal-Organic, and Nano-Metal Chemistry, Vol. 39, Iss. 6, 2009-07 ,pp. : 331-340

Taylor & Francis Ltd

Access to resources Recommend Favorite