Recrystallization Behavior of Aluminum Layers in Al/Ti/Si and Al/Ti/SiOx/Si Structures

Author: Snitovsky Yu.  

Publisher: MAIK Nauka/Interperiodica

ISSN: 0020-1685

Source: Inorganic Materials, Vol.41, Iss.8, 2005-08, pp. : 807-811

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Abstract