Short-circuited double Langmuir probe as a model of a conducting wafer under plasma processing

By Aleksandrov A.   Riaby V.   Savinov V.   Yakunin V.  

Russian Microelectronics, Vol. 34, Iss. 1, 2005-01 ,pp. : 18-21

MAIK Nauka/Interperiodica

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Plasma etching of poly-Si/SiO₂/Si structures: Langmuir-probe and optical-emission-spectroscopy monitoring

By Rudenko K.   Myakon’kikh A.   Orlikovsky A.  

Russian Microelectronics, Vol. 36, Iss. 3, 2007-05 ,pp. : 179-192

MAIK Nauka/Interperiodica

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New Possibilities of Radioastronomical Diagnostics of the Jovian Magnetosphere Using the Observed Polarization of its Decameter Radio Emission

By Shaposhnikov V.E.  

Radiophysics and Quantum Electronics, Vol. 44, Iss. 1-2, 2001-01 ,pp. : 62-71

Springer Publishing Company

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A new method for quantum device simulation

By Sharifi Mohammad J.   Adibi A.  

International Journal of Electronics, Vol. 86, Iss. 9, 1999-09 ,pp. : 1051-1062

Taylor & Francis Ltd

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Reading sensitivity of a new thermomechanical data-storage technique: The effect of reducing probe dimensions

By Petrin A.  

Russian Microelectronics, Vol. 35, Iss. 2, 2006-03 ,pp. : 105-115

MAIK Nauka/Interperiodica

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