Short-circuited double Langmuir probe as a model of a conducting wafer under plasma processing

Author： Aleksandrov A.   Riaby V.   Savinov V.   Yakunin V.  

Publisher： MAIK Nauka/Interperiodica

ISSN： 1063-7397

Source： Russian Microelectronics, Vol.34, Iss.1, 2005-01, pp. : 18-21

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