Modeling of deep grooving of silicon in the process of plasmochemical cyclic etching/passivation

Author: Shumilov A.   Amirov I.  

Publisher: MAIK Nauka/Interperiodica

ISSN: 1063-7397

Source: Russian Microelectronics, Vol.36, Iss.4, 2007-07, pp. : 241-250

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