Interrelation between the Parameters of Chemical Vapor Deposition, Properties, and Structure of Borophosphosilicate Glass Films Used in the Silicon Integrated Circuit Technology

Author: Vasilev V. Yu.  

Publisher: MAIK Nauka/Interperiodica

ISSN: 1087-6596

Source: Glass Physics and Chemistry, Vol.29, Iss.5, 2003-09, pp. : 461-470

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