Author: Fainer N. Kosinova M. Rumyantsev Yu. Maksimovskii E. Kuznetsov F. Kesler V. Kirienko V. Han Bao-Shan Lu Cheng
Publisher: MAIK Nauka/Interperiodica
ISSN: 1087-6596
Source: Glass Physics and Chemistry, Vol.31, Iss.4, 2005-07, pp. : 427-432
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Abstract
Nanocrystalline films of a ternary compound, namely, silicon carbonitride SiCxNy, are prepared by plasma-enhanced chemical vapor deposition at temperatures of 473–1173 K with the use of a complex gaseous mixture of hexamethyldisilazane Si2NH(CH3)6, ammonia, and helium. The chemical and phase compositions and the physicochemical properties of the films are investigated using IR, Auger electron, and X-ray photoelectron spectroscopy; ellipsometry; synchrotron X-ray powder diffraction; electron and atomic-force microscopy; microhardness measurements with a nanoindenter; and electrical measurements. Correlations of the composition of the initial gas phase and the synthesis temperature with a number of functional properties of the SiCxNy silicon carbonitride films are revealed.
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